序號
|
產(chǎn)品型號
|
檢測氣體
|
化學式
|
測量范圍
|
測量誤差
|
最小示值
|
反應時間
|
0
|
LB-200-PH3
|
磷化氫
|
PH3
|
0-20-1000ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤40s
|
1
|
LB-200-O2
|
氧氣
|
O2
|
0-25.0%
|
≤±0.5%
|
0.1%
|
≤20s
|
2
|
LB-200-LEL
|
可燃氣
|
Ex
|
0-100%LEL
|
≤±5%(F.S)
|
1%LEL
|
≤30s
|
3
|
LB-200-CO
|
一氧化碳
|
CO
|
0-2000ppm
|
≤±5%(F.S)
|
1ppm
|
≤30s
|
4
|
LB-200-H2S
|
硫化氫
|
H2S
|
0-200ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤40s
|
5
|
LB-200-NO2
|
二氧化氮
|
NO2
|
0-200ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤30s
|
6
|
LB-200-NO
|
一氧化氮
|
NO
|
0-1000ppm
|
≤±5%(F.S)
|
1ppm
|
≤30s
|
7
|
LB-200-SO2
|
二氧化硫
|
SO2
|
0-200ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤30s
|
8
|
LB-200-Cl2
|
氯氣
|
Cl2
|
0-200ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤90s
|
9
|
LB-200-NH3
|
氨氣
|
NH3
|
0-200ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤150s
|
10
|
LB-200-H2
|
氫氣
|
H2
|
0-2000ppm
|
≤±5%(F.S)
|
1ppm
|
≤90s
|
11
|
LB-200-HCN
|
氰化氫
|
HCN
|
0-200ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤200s
|
12
|
LB-200-O3
|
臭氧
|
O3
|
0-1.0-5.0ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤120s
|
13
|
LB-200-F2
|
氟氣
|
F2
|
0-1ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤30s
|
14
|
LB-200-HF
|
氟化氫
|
HF
|
0-10ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤60s
|
15
|
LB-200-HCl
|
氯化氫
|
HCl
|
0-30-200ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤30s
|
16
|
LB-200-HBr
|
溴化氫
|
HBr
|
0-30ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤30s
|
17
|
LB-200-C2H4O
|
環(huán)氧乙烷
|
C2H4O
|
0-100ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤90s
|
18
|
LB-200-COCl2
|
光氣
|
COCl2
|
0-1ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤60s
|
19
|
LB-200-SiH4
|
硅烷
|
SiH4
|
0-20ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤30s
|
20
|
LB-200-GeH4
|
鍺烷
|
GeH4
|
0-2ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤60s
|
21
|
LB-200-AsH3
|
砷化氫
|
AsH3
|
0-1ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤30s
|
22
|
LB-200-ClO2
|
二氧化氯
|
ClO2
|
0-1.0-200ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤120s
|
23
|
LB-200-N2H4
|
四氫化氮
|
N2H4
|
0-1ppm
|
≤±5%(F.S)
|
0.1ppm
|
≤30s
|
24
|
LB-200-B2H6
|
乙硼烷
|
B2H6
|
0-0.5ppm
|
≤±5%(F.S)
|
0.01ppm
|
≤30s
|
25
|
LB-200-H2
|
氫氣
|
H2
|
0-1.0-4.0%
|
≤±5%(F.S)
|
0.01%
|
≤60s
|
26
|
LB-200-NH3
|
氨氣
|
NH3
|
0-1000ppm
|
≤±5%(F.S)
|
1ppm
|
≤30s
|